The Minsk Research Institute of Radiomaterials of the National Academy of Sciences of Belarus offers photomasks for photolithographic equipment to consumers under a manufacturing agreement and is lookinh for partners interested in a distribution services agreement.

Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon).

OJSC "Minsk Research Institute of Radiomaterials" of the National Academy of Sciences of Belarus manufactures precision photomasks on glass (K8) or quartz substrates, designed for projection photolithography in the production of integrated circuits, thin-film, microstrip and microwave boards, semiconductor devices for various purposes, etc.

Manufacturing process of photomasks uses photoresists, with the area of maximum sensitivity near UV radiation. The pattern is formed by focused laser with a wavelength of 355 nm.

Precision photomasks are manufactured using modern equipment (the EM-5189-02 multichannel laser image generator). They feature highly accurate non-metric dimensions of pattern elements and the pitch between fragments, stable patterns and dimensions over time, and high image contrast.

Brief technical specifications of the image generator and photomasks are available on the Research Institute of Radio Materials website here.

Photomasks are characterized by:
* high resolution;
* a large number of identical images;
* high optical density of opaque areas;
* high quality of the drawing surface;
* uniformity of the pattern;
* abrasion resistance;
* flatness of the working side.

Types of photomasks produced:
* with iron oxide masking coating;
* with chrome masking coating.

Technical specifications:

minimum element size	0,6 µm
thickness	2,2..6,4 mm
overall dimensions of the workpieces	127 mm (5"),152 mm (6") and 178 mm (7")
unevenness of the edge of the element	not more than 0,3 microns
rounding the corner of an element	not more than 0,5 microns
the error of joining the strips	not more than ±40 nm
the error of the connection	not more than ±70 nm

Areas of use: optics, optoelectronics, laser technology and microelectronics.
Minsk Research Institute of Radiomaterials offers partners lithographic photomasks under a manufacturing agreement.

Catalog of innovative developments of organizations of the NAS of Belarus for the replacement of critical imports (2022), pp. 10-11 (in Russian)

A film about the technologies of the Research Institute of Radio Materials can be seen here.

Photolithography masks from the Minsk Research Institute of Radiomaterials (RIRM) are precision masks on K8 glass or quartz, produced using the EM-5189-02 laser generator for microelectronics and microwave circuit boards. They are designed to replace imported analogs from Russia, China, the USA, and the UK.

Advantages of RIRM photolithography masks:
- High precision of element geometric dimensions and fragment pitch, pattern stability over time, and high image contrast.
- Characteristics include high resolution (up to 0.6 µm elements), a large number of identical images, high optical density of opaque areas, uniformity, and flatness.

This ensures import substitution and is suitable for projection photolithography in optics, optoelectronics, and microelectronics.

Analogues

Zelenograd Nanotechnology Center	Russia	Precision photomasks for microelectronics
NPC Ferrit-Kvantar	Russia	Photolithography masks
NPC Avangard	Russia	Similar precision masks
NPP "MMS Radars"	Russia	Photomasks for microwave
Xiamen Powerway Advanced Material	China	Imported masks on quartz
Photronics, Inc.	USA	Global leader in photomasks
Compugraphics International	United Kingdom	High-precision masks for EUV/UV

The specialization of the institute includes the following main areas:
* development and production of the element base and functional units of microwave technology (solid-state microwave monolithic integrated circuits - low-noise amplifiers and power amplifiers, protective devices, switches, attenuators, frequency converters; microwave modules, etc.);
* development and production of optoelectronic components and modules based on them (photodetectors, light emitting diodes, semiconductor lasers, receiving and transmitting optical modules);
* production of materials for semiconductor production - gallium arsenide substrates of the "epi-ready" standard;
* development of sensor technology, modules and systems (sensors for inclination, pressure, acceleration, electronic compass, etc.);
* development and production of medical equipment.

The research and production base of the institute includes dedicated equipment which allows to develop and perform a full cycle of technological operations for the manufacture of microwaves, optoelectronic components, sensors of physical quantities based on microelectromechanical systems, equipment for the manufacture of medical products - Glucosen sensors etc. In particular, the equipment allows cutting semiconductor ingots of A3B5 compounds (GaAs, InP, GaN, etc.), grinding and polishing wafers, epitaxial growth, thermal diffusion and implantation of dopants, microcircuit packaging, control of their parameters, etc.

The Institute has a licensed software for electrodynamic calculations, its own library of standard elements, methods for monitoring and testing microwave components in the C, S, L, X, K wavelength ranges, electronic lithography equipment with a resolution of 100 nm, which provides a modern level of design standards.

As part of the specialization, the development of technologies, components and devices for various radio-electronic systems is carried out: radar systems, fiber-optic communication lines, laser rangefinders, systems for leveling and orientation of objects, control systems, guidance and navigation, etc.

Consumers interested in purchasing photolithography masks under a manufacturing agreement.

Partners interested in purchasing photolithography masks under a distribution services agreement.