Minsk Research Institute of Radiomaterials

220024 Minsk, Lieutenant Kizhevatov str. 86-2

Services for transferring a pattern on glass by photolithography










Linked profile in other language
Natalia Mikhaseva
+ 375 33 333 9522
Minsk Research Institute of Radiomaterials of the National Academy of Sciences of Belarus offers consumers services for transferring a patterns on glass substrate by photolithography under an outsourcing agreement or subcontract.
Minsk Research Institute of Radiomaterials of the National Academy of Sciences of Belarus is equipped with modern photolithography machines. It offers services for transferring patterns on glass substrates. Glasses with patterns are used in various optical products.

The patterns are transferred by the vacuum-plasma etching method, were the removal of the glass occurs mechanically due to bombardment by a stream of charged particles (inert gas ions). For this, a discharge is ignited in a vacuum chamber at a gas pressure of 1÷10 Pa and the glass surface as a cathode is bombarded with ions at energy level up to 1 keV. Since the movement of inert gas ions occurs normal to the surface of the glass, the etched areas correspond exactly to the size of the photomask windows.

The etched area of the pattern can be filled with material according to the customer's requirements.

The patterns characterized by:
* wear resistance and durability;
* high surface quality;
* uniformity.

The minimum size of the pattern element is 7 microns.

Areas of application:
* optics;
* optoelectronics;
* lasers;
* microelectronics.

OJSC "Minsk Research Institute of Radiomaterials" offers partners services for transferring a patterns on glass substrate by photolithography under a outsourcing agreement or subcontract.
Advantages and Innovations
Services for applying patterns on glass by photolithography are similar to those provided by the following companies on the Belarusian market:
JSC «PELENG» (Republic of Belarus);
JSC «PLANAR» (Republic of Belarus).
Stage of development
Already on the market
Funding source
State budged
IPR status
Exclusive rights
Secret know-how
Sector group
Nano and micro technologies

Organization information

R&D institution
Year established
NACE keywords
C.32.99 - Other manufacturing n.e.c.
M.72.19 - Other research and experimental development on natural sciences and engineering
Turnover (in EUR)
Already engaged in transnational cooperation
Additional comments
The specialization of the institute includes the following main areas:
* development and production of the element base and functional units of microwave technology (solid-state microwave monolithic integrated circuits - low-noise amplifiers and power amplifiers, protective devices, switches, attenuators, frequency converters; microwave modules, etc.);
* development and production of optoelectronic components and modules based on them (photodetectors, light emitting diodes, semiconductor lasers, receiving and transmitting optical modules);
* production of materials for semiconductor production - gallium arsenide substrates of the "epi-ready" standard;
* development of sensor technology, modules and systems (sensors for inclination, pressure, acceleration, electronic compass, etc.);
* development and production of medical equipment.

The research and production base of the institute includes dedicated equipment which allows to develop and perform a full cycle of technological operations for the manufacture of microwaves, optoelectronic components, sensors of physical quantities based on microelectromechanical systems, equipment for the manufacture of medical products - Glucosen sensors etc. In particular, the equipment allows cutting semiconductor ingots of A3B5 compounds (GaAs, InP, GaN, etc.), grinding and polishing wafers, epitaxial growth, thermal diffusion and implantation of dopants, microcircuit packaging, control of their parameters, etc.

The Institute has a licensed software for electrodynamic calculations, its own library of standard elements, methods for monitoring and testing microwave components in the C, S, L, X, K wavelength ranges, electronic lithography equipment with a resolution of 100 nm, which provides a modern level of design standards.

As part of the specialization, the development of technologies, components and devices for various radio-electronic systems is carried out: radar systems, fiber-optic communication lines, laser rangefinders, systems for leveling and orientation of objects, control systems, guidance and navigation, etc.
Languages spoken

Information about partnership

Type of partnership considered
Outsourcing agreement
Type and role of partner sought
Consumers that are interested in photolithographic services for applying patterns on glass under an outsourcing agreement or subcontract.
Type and size of partner sought
> 500
SME 51-250
SME 11-50
SME <= 10
R&D Institution


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Statistics since 27.11.2023 11:49:25